J.N. Burghartz, J.D. Cressler, et al.
ESSDERC 1991
The role of dislocation-dislocation interactions on the relaxation behavior of biaxially stressed semiconductor thin films is considered by including interaction terms in an energy minimization. Both parallel and crossing interactions are considered and energies are calculated for orthogonal arrays of equally spaced 60°misfit dislocations, and it is shown that the parallel interactions can be either attractive or repulsive. The equilibrium misfit dislocation density is shown to be a function of the "cutoff" distance for dislocation interactions in these structures.
J.N. Burghartz, J.D. Cressler, et al.
ESSDERC 1991
S. Stiffler
Journal of Applied Physics
P. Agnello, T.O. Sedgwick, et al.
Applied Physics Letters
C. Smart, S.K. Reynolds, et al.
MRS Proceedings 1992