Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Paper

01 Jul 1987

Summary abstract: Time-resolved study of oxygen reaction on si(100) surfaces using pulsed molecular beam reactive scattering

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Abstract

No abstract available.

Paper

Ab initio molecular dynamics simulation of liquids and solutions

Michiel Sprik

Journal of Physics Condensed Matter

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Kinetic model for the chemical vapor deposition of tungsten in the silane reduction process

Julian J. Hsieh

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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Metastable phase formation in thin film reactions

K.N. Tu

Materials Science and Engineering: A

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Electrochemical characterization of adsorption-desorption of the cuprous-suppressor-chloride complex during electrodeposition of copper

John G. Long, Peter C. Searson, et al.

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