PublicationJVSTAPaperSummary Abstract: Reactive ion-etching-related Si surface residues and subsurface disorderJVSTAView publicationAbstractNo abstract available.Home↳ PublicationsDate01 Jan 1986PublicationJVSTAAuthorsG.S. OehrleinJ.G. ClabesG.J. CoyleJ.C. TsangY.H. LeeIBM-affiliated at time of publicationTopicsPhysical SciencesMaterials DiscoveryShare
