Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
No abstract available.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
M. Tismenetsky
International Journal of Computer Mathematics
Y.Y. Li, K.S. Leung, et al.
J Combin Optim
Paul J. Steinhardt, P. Chaudhari
Journal of Computational Physics