Studies of excimer laser ablation of solids using a Michelson interferometer

R.E. Walkup; J.M. Jasinski; R.W. Dreyfus

doi:10.1063/1.96807

Applied Physics Letters

Paper

01 Jan 1986

Studies of excimer laser ablation of solids using a Michelson interferometer

View publication

Abstract

A Michelson interferometer has been used as a direct quantitative probe for gas phase plasma formation in the UV excimer laser ablation of solids. Excimer laser fluence thresholds for plasma formation are determined and correlated with optical emission from electronically excited ablation fragments.

Conference paper

Studies of excimer laser etching mechanism using laser induced fluorescence measurements

R.F. Dreyfus, Roger Kelly, et al.

Proceedings of SPIE 1989

Paper

Summary Abstract: Energy distributions of electronically excited molecules produced by ion bombardment of silicon

R.E. Walkup, Ph. Avouris

JVSTA

Paper

Absolute rate constants for the reaction of SiH with hydrogen, deuterium and silane

M.H. Begemann, R.W. Dreyfus, et al.

Chemical Physics Letters

Paper

The kinetic and internal energies of OH(A²Σ⁺) produced by electron stimulated desorption from TiO₂, NaCl and SrF₂ surfaces

Ph. Avouris, R. Beigang, et al.

Chemical Physics Letters

View all publications

Abstract

Related

Studies of excimer laser etching mechanism using laser induced fluorescence measurements

Summary Abstract: Energy distributions of electronically excited molecules produced by ion bombardment of silicon

Absolute rate constants for the reaction of SiH with hydrogen, deuterium and silane

The kinetic and internal energies of OH(A2Σ+) produced by electron stimulated desorption from TiO2, NaCl and SrF2 surfaces

The kinetic and internal energies of OH(A²Σ⁺) produced by electron stimulated desorption from TiO₂, NaCl and SrF₂ surfaces