C.E. Otis, R.W. Dreyfus
Physical Review Letters
The techniques of optical emission spectroscopy with actinome-try, laser induced fluorescence spectroscopy, laser optogalvanic spectroscopy and absorption spectroscopy are discussed. Examples of the application of these techniques to probing low pressure plasmas of the type used in microelectronics materials processing are presented. © 1985 IUPAC
C.E. Otis, R.W. Dreyfus
Physical Review Letters
R.W. Dreyfus, A.J. Landon
IEEE Transactions on Magnetics
R.W. Dreyfus, R.T. Hodgson
Applied Physics Letters
N.I. Buchan, J.M. Jasinski
Journal of Crystal Growth