Structural characterization of Co in sputtered Ta/Co/Ta thin-film sandwiches

Abstract

The morphology and structure of sputtered Ta/Co/Ta thin-film sandwiches were investigated by cross-sectional high-resolution transmission electron microscopy. Although the Co layer shows an overall 〈111〉-oriented fcc structure, a high density of hcp stacking faults in present in the layer. The Co structure can thus be described as a random distribution of hcp stacking sequences in an overall fcc structure. © 1995.