Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This paper establishes the viability and suitability of silicon germanium (SiGe8HP) technology, enablement tools and circuits to millimetre-wave applications today and a roadmap to the future. Key elements discussed include SiGe technology and design enablement advancements leading to the world's most highly integrated, lowest power 60 GHz transmitter/receiver ICs. © 2007 IOP Publishing Ltd.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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Physics of Fluids
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials
David B. Mitzi
Journal of Materials Chemistry