Shashanka Ubaru, Lior Horesh, et al.
Journal of Biomedical Informatics
We have designed and developed an aqueous base soluble polymer system with a silsesquioxane (SSQ) backbone for 157 nm bilayer resist applications. These base resins have absorbances as low as 0.6 μm-1 at 157 nm. The imagable polymers which contain acid-labile ester functionalities have absorbances between 2.0 and 3.0 μm-1. The silicon content of these polymers is around 15% by weight. Therefore, our polymers can be utilized in 157 nm positive bilayer resist applications with a film thickness of around 150 nm. We have evaluated several resist formulations based on these polymers. These resist formulations have shown high contrast and excellent resolution. © 2001 SPIE - The International Society for Optical Engineering.
Shashanka Ubaru, Lior Horesh, et al.
Journal of Biomedical Informatics
David L. Shealy, John A. Hoffnagle
SPIE Optical Engineering + Applications 2007
Minghong Fang, Zifan Zhang, et al.
CCS 2024
Ruixiong Tian, Zhe Xiang, et al.
Qinghua Daxue Xuebao/Journal of Tsinghua University