Stephen M. Gates
Surface Science
Paper
Silicon Chemical Vapor Deposition One Step at a Time: Fundamental Studies of Silicon Hydride Chemistry
Abstract
No abstract available.
Related
F.W. Zeng, Stephen M. Gates, et al.
AIP Advances
E. T. Ryan, Deepika Priyadarshini, et al.
IITC/MAM 2015
C. Michael Greenlief, Stephen M. Gates, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films