Accounts of Chemical Research

Paper

01 May 2002

Silicon Chemical Vapor Deposition One Step at a Time: Fundamental Studies of Silicon Hydride Chemistry

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Abstract

No abstract available.

Paper

Surface loss coefficients for the silyl radical

Joseph M. Jasinski

Journal of Physical Chemistry

Paper

Adsorption kinetics of SiH₄, Si₂H₆ and Si₃H₈ on the Si(111)-(7×7) surface

Stephen M. Gates

Surface Science

Paper

Sequential lateral solidification of silicon thin films on low-k dielectrics for low temperature integration

Fabio Carta, Stephen M. Gates, et al.

Applied Physics Letters

Review

Progress in the development and understanding of advanced low k and ultralow k dielectrics for very large-scale integrated interconnects - State of the art

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Applied Physics Reviews

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