Accounts of Chemical Research

Paper

01 May 2002

Silicon Chemical Vapor Deposition One Step at a Time: Fundamental Studies of Silicon Hydride Chemistry

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Abstract

No abstract available.

Paper

Absolute rate constants for the reaction of silylene with hydrogen, silane, and disilane

Joseph M. Jasinski, Jack O. Chu

The Journal of Chemical Physics

Paper

Formation of gas-phase silyl radicals in the atomic hydrogen etching of silicon

Joseph M. Jasinski

Chemical Physics Letters

Paper

Surface loss coefficients for the silyl radical

Joseph M. Jasinski

Journal of Physical Chemistry

Paper

Adsorption kinetics of SiH₄, Si₂H₆ and Si₃H₈ on the Si(111)-(7×7) surface

Stephen M. Gates

Surface Science

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