Publication
Applied Physics Letters
Paper

Silicide films for archival optical storage

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Abstract

We demonstrate here that bilayer films consisting of Si and transition metals with a layer thickness of 15-40 nm are promising materials for archival optical storage. They show a large optical reflectivity change before and after silicide formation, have a long lifetime at room temperature, and are nontoxic.

Date

01 Dec 1981

Publication

Applied Physics Letters

Authors

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