About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
IEEE Electron Device Letters
Paper
SiGe power HBT's for low-voltage, high-performance RF applications
Abstract
Silicon-Germanium (SiGe) power heterojunction bipolar transistors (HBT's) are fabricated by using two or ten device unit cells with an emitter area of 5 × 0.5 × 16.5 μm 2 each. The large power transistor features 1 W rf output power at 3-dB gain compression, 3.5 V bias, and 2.4 GHz with a maximum power-added-efficiency (PAE) of 48% for Class A/B operation. At a supply voltage of 1.5 V, the transistor delivers a 3-dB rf output power of 150 mW with a PAE of 47%. It is shown that a high collector doping level is advantageous for low-voltage operation. Further, by using special bias sense ports, the interconnect losses are found to degrade the device performance to a considerable degree.