Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Surface and interface segregation of block copolymer micelles in a model system has been observed. The distribution of a diblock copolymer within a high molecular weight homopolymer matrix phase was determined quantitatively by forward recoil spectrometry. Cross-sectional transmission electron microscopy showed that excess copolymer segregation to the homopolymer / homopolymer and homopolymer/ vacuum interfaces was due to the preferential segregation of block copolymer micelles to these interfaces. We argue that the segregation of block copolymer micelles is a manifestation of attractive interactions between polymer brushes, and between polymer brushes and a free surface, which are important in high molecular weight homopolymer matrices. © 1991, American Chemical Society. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
A. Reisman, M. Berkenblit, et al.
JES
Mark W. Dowley
Solid State Communications