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This letter reports about the application of a miniaturized electron microscope for generating scanning secondary-electron images. The employed electrostatic lens-system was fabricated using silicon microfabrication techniques and a scanning tunneling microscope, operated in the field emission mode, was used as electron source. A resolution of better than 100 nm at a beam energy of 200 eV was achieved. © Les Éditions de Physique 1996.
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