PaperFormation of stoichiometric SiGe oxide by electron cyclotron resonance plasmaP.W. Li, H.K. Liou, et al.Applied Physics Letters
PaperSchottky barrier, electronic states and microstructure at Ni silicide-silicon interfacesP.S. Ho, M. Liehr, et al.Surface Science
PaperLaser annealing of epitaxial garnet films under controlled atmospheresD.A. Herman Jr., J.C. Deluca, et al.Journal of Applied Physics
PaperObservation of anomalous resistive transition around 160-200 K in Y 5Ba6Cu11Ox thin filmsQ.Y. Ma, Chin-An Chang, et al.Journal of Applied Physics