Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We establish the equivalence between a one-dimensional sandpile model recently introduced by Chhabra et al. [Phys. Rev. A (to be published)], and the diffusion-limited reaction A+A0 with a point source. The equivalence is used to predict the power-law decay of the avalanche size distribution, P(s)s-3, in agreement with numerical simulations. This result differs from the mean-field treatment of Chhabra et al., demonstrating the importance of fluctuations in this low-dimensional system. © 1993 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
Ming L. Yu
Physical Review B