Publication
Applied Physics Letters
Review

Response to "comment on 'E' centers and nitrogen-related defects in silicon dioxide films'"

View publication

Abstract

The anomalous properties of defect centers observed by Warren and Lenahan (ref. 1), in certain plasma enhanced chemical vapor deposited silica films must be examined in a broader light. The presence of a compensating impurity is indicated.(AIP).

Date

Publication

Applied Physics Letters

Authors

Share