D. Jousse, Jerzy Kanicki, et al.
Applied Surface Science
The anomalous properties of defect centers observed by Warren and Lenahan (ref. 1), in certain plasma enhanced chemical vapor deposited silica films must be examined in a broader light. The presence of a compensating impurity is indicated.(AIP).
D. Jousse, Jerzy Kanicki, et al.
Applied Surface Science
J.H. Stathis, J. Chapple-Sokol, et al.
Applied Physics Letters
R. Rodríguez, J.H. Stathis, et al.
Microelectronics Reliability
E.A. Irene, E. Tierney, et al.
Applied Physics Letters