Reflection high-energy electron diffraction monitored growth of infinite-layer srcuo₂/cacuo₂ thin film heterostructures

Abstract

Reflection high-energy electron diffraction (RHEED) intensity oscillations have been used for controlled, layer-by-layer growth of thin film heterostructures of the infinite-layer end-member compounds SrCuO2 and CaCuO2. These artificially structured films are grown on (100) SrTiO3 substrates by pulsed laser deposition under a low-pressure oxygen ambient, using a combination of atomic oxygen and pulsed molecular oxygen, at a relatively low temperature of 500°C. X-ray diffraction and transmission electron microscopy are used for the structural characterization of the epitaxial heterostructures. Systematic variations in the electrical properties of the multilayers have been observed as a function of the thickness of the SrCuO2 and CaCuO2 layers for unit-cell-level modulation periods. © 1995 Academic Press.