Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Many VLSI circuits to which WR might be applied exhibit a regular, symmetric structure. For such circuits, general spectral estimates of the convergence rate are not necessarily very accurate. By relying on a detailed analysis of the system structure, estimates for the convergence of the waveform relaxation method are given for RC circuits arising as simplified models of a VLSI interconnect. These examples suggest a new approach to WR convergence estimation. © 1993.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
Arnon Amir, Michael Lindenbaum
IEEE Transactions on Pattern Analysis and Machine Intelligence
Zhihua Xiong, Yixin Xu, et al.
International Journal of Modelling, Identification and Control