Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Many VLSI circuits to which WR might be applied exhibit a regular, symmetric structure. For such circuits, general spectral estimates of the convergence rate are not necessarily very accurate. By relying on a detailed analysis of the system structure, estimates for the convergence of the waveform relaxation method are given for RC circuits arising as simplified models of a VLSI interconnect. These examples suggest a new approach to WR convergence estimation. © 1993.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Naga Ayachitula, Melissa Buco, et al.
SCC 2007
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
Robert F. Gordon, Edward A. MacNair, et al.
WSC 1985