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Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
In this paper we study the rate at which a rumor spreads through an undirected graph. This study has two important applications in distributed computation: in simple, robust and efficient broadcast protocols, and in the maintenance of replicated databases. Copyright © 1990 Wiley Periodicals, Inc., A Wiley Company
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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Qinghua Daxue Xuebao/Journal of Tsinghua University
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Journal of Approximation Theory
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