Properties of Cr-N films produced by reactive sputtering

Cr-N films have been produced by reactive sputtering of Cr in an argon-nitrogen atmosphere. The dependence of composition and resistivity of the sputtered films on nitrogen partial pressure in the sputtering gas mixture has been determined. The structure of these films was characterized by x-ray diffraction and found to be polycrystalline in nature with a fiber texture. The Knoop hardness of these films has been measured with values of about 1000 kg/mm2. The temperature coefficient of resistivity is negative and quite large in most of the films. © 1986, American Vacuum Society. All rights reserved.