Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
A. Grill, B.S. Meyerson, et al.
Proceedings of SPIE 1989
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
R.A. Brualdi, A.J. Hoffman
Linear Algebra and Its Applications