Plasma swelling of photoresist

Abstract

A polymer swelling phenomenon in the hydrogen-containing freon plasma has been observed. The new polymer has a mushroom profile and is very resistant to plasma attack. The swelling rate and the new polymer structure are studied. The swelling process includes l) new bonds formation, 2) fragments loss, and 3) hydrogenation. The top swollen part and the bottom non-swollen part were compared with the LAMM A (Laser Microprobe Mass Analysis) method. The swollen process is probably caused by the strong ion bombardment in combination with hydrogenation reactions. Possible applications of this new structure are discussed. © 1993 The Japan Society of Applied Physics.