MARS2: An advanced femtosecond laser mask repair tool
Alfred Wagner, Richard Haight, et al.
SPIE Photomask Technology 2002
We describe an experiment designed to carry out photoelectron spectroscopy on individual nanowires of Si and Ge. Laser generated, 150 fs pulses of 200 nm light (6.2 eV) were focused onto a single Si or Ge nanowire; the ensuing photoemitted electrons were measured with 20 meV resolution. Fermi level locations within the individual Si and Ge nanowire band gaps and work functions of hydrogen terminated nanowires were measured. Polarization dependent electron emission was observed and compared with Mie theory. © 2007 American Institute of Physics.
Alfred Wagner, Richard Haight, et al.
SPIE Photomask Technology 2002
Richard Haight
Surface Science Reports
Priscilla D. Antunez, Douglas M. Bishop, et al.
Advanced Energy Materials
Armin Rettenberger, Richard Haight
Physical Review Letters