About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Organometallics
Paper
Photodegradation of Poly(dialkylsilane)s In Solution: The Persistent Radicals Have an Unexpected Structure
Abstract
The structure of the initial persistent radicals observed upon UV irradiation of poly(dialkylsilane)s (R2Si)n in solution, at any wavelength absorbed, is -SiR2-SiR-SiR2- as determined by EPR and ENDOR spectroscopy. A mechanism proposed for their formation consists of several steps, initiated by a new photochemical chain-breaking process, reductive elimination on a Si-Si-C unit, with the formation of trialkylsilyl terminal groups. The presence of such terminal groups in the irradiated product was established by GC-MS analysis after exhaustive irradiation at 254 nm. © 1988, American Chemical Society. All rights reserved.