Sung Ho Kim, Oun-Ho Park, et al.
Small
Thin W films, deposited by magnetron sputtering, were deposited on silicon-dioxide surfaces at near-room temperature at thicknesses from 3 to 150 nm. As such, films below 45 nm thickness showed evidence of metastable beta-phase W which changed to alpha phase in a period of hour to days at room temperature, and faster at elevated temperature. Films >45 nm thickness, when deposited with better cooling, showed evidence of beta-phase W which then changed to alpha phase in tens of hours with an average activation energy of 1.1±0.2 eV.
Sung Ho Kim, Oun-Ho Park, et al.
Small
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures