J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications
Thin W films, deposited by magnetron sputtering, were deposited on silicon-dioxide surfaces at near-room temperature at thicknesses from 3 to 150 nm. As such, films below 45 nm thickness showed evidence of metastable beta-phase W which changed to alpha phase in a period of hour to days at room temperature, and faster at elevated temperature. Films >45 nm thickness, when deposited with better cooling, showed evidence of beta-phase W which then changed to alpha phase in tens of hours with an average activation energy of 1.1±0.2 eV.
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films