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Publication
IEEE Journal of Solid-State Circuits
Paper
Performance Limits of CMOS ULSI
Abstract
An analytic MOST model has been developed to calculate accurately threshold voltage at submicrometer dimensions and to predict the scaling limits of digital CMOS circuits. Salient results show that for 2-V power-supply voltages, channel lengths as small as 0.14 μm for static E/E CMOS, 0.20 μm for static E/D CMOS, 0.29 μm for dynamic transmission-gate CMOS, and 0.45 μm for static E/D NMOS circuits are possible. At submicrometer dimensions, CMOS offers as much as a 3:1 scaling advantage in minimum channel length which translates to a 5:1 improvement in gate delay when compared to NMOS. Thus CMOS is projected as the dominant ULSI technology, not only due to its well known large operating margins, low static-power dissipation and design flexibility but also due to markedly superior speed. Copyright © 1985 by the Institute of Electrical and Electronics Engineers, Inc.