Chung-Hsun Lin, Wilfried Haensch, et al.
VLSI Technology 2011
Paper
Performance-aware corner model for design for manufacturing
Abstract
We present a methodology to generate performance-aware corner models (PAMs). Accuracy is improved by emphasizing electrical variation data and reconciling the process and electrical variation data. PAM supports corner (± σ and ±2σ) simulation and Monte Carlo simulation. Furthermore, PAM supports the practice of application-specific corner cards, for example, for gain-sensitive applications. © 2009 IEEE.
Related
Sujata Paul, Frank Yeh, et al.
IEEE Electron Device Letters
Sriramkumar Venugopalan, Muhammed A. Kari, et al.
SISPAD 2012
Qing Cao, Shu-Jen Han, et al.
Nature Nanotechnology