Conference paper
Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
We describe an effective method for doing binary-encoded modeling, in the context of 0/1 linear programming, when the number of feasible configurations is not a power of two. Our motivation comes from modeling all-different restrictions. © 2005 Elsevier B.V. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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Mathematics
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