Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We describe an effective method for doing binary-encoded modeling, in the context of 0/1 linear programming, when the number of feasible configurations is not a power of two. Our motivation comes from modeling all-different restrictions. © 2005 Elsevier B.V. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
James Lee Hafner
Journal of Number Theory
Nimrod Megiddo
Journal of Symbolic Computation
Ligang Lu, Jack L. Kouloheris
IS&T/SPIE Electronic Imaging 2002