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Publication
ACS Spring 1991
Conference paper
Overview of top-surface-imaging resists
Abstract
This talk address the various chemical mechanisms used in plasma developable resists and focus on specific schemes used in top-surface-imaging (TSI). TSI is not the only term used to describe this resist class. SIR (surface-imaging-resist), limited penetration lithography, and near-surface imaging, have also been used to describe this scheme.