Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
In this paper we identify a class of estimation problems in which sequential estimation procedures do not yield a better rate of convergence then procedures in which all the observations are preassigned in advance. © 1980, Taylor & Francis Group, LLC. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
J. LaRue, C. Ting
Proceedings of SPIE 1989