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Modeling polarization for Hyper-NA lithography tools and masks
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In this paper we identify a class of estimation problems in which sequential estimation procedures do not yield a better rate of convergence then procedures in which all the observations are preassigned in advance. © 1980, Taylor & Francis Group, LLC. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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