Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
We describe how the unique capabilities of molecular beam epitaxy together with the electron-beam lithography and reactive-ion etching can be utilized to realize novel quasi-one- and zero-dimensional electron systems. We also present the results of capacitive and tunneling studies on these quantum systems. © 1989.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Ellen J. Yoffa, David Adler
Physical Review B
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
K.N. Tu
Materials Science and Engineering: A