On the scaling property of trench isolation capacitance for advanced high-performance ECL circuits

A detailed study on the scaling property of trench isolation capacitance for advanced high-performance bipolar applications is presented. Using two-dimensional numerical simulations, it is shown that depending on the particular trench used, the trench isolation capacitance has a distinct dependence on the trench width. The impact on the scaled-down high-performance ECL circuits is examined. It is concluded that the design and optimization of scaled-down devices and circuits would require an in-depth understanding of the trench isolation parasitics to realize the full potential of advanced technology.