Conference paper
Single and dual wavelength exposure of photoresist
J. LaRue, C. Ting
Proceedings of SPIE 1989
This paper considers the number of inner iterations required per outer iteration for the algorithm proposed by Conn et al. [9]. We show that asymptotically, under suitable reasonable assumptions, a single inner iteration suffices.
J. LaRue, C. Ting
Proceedings of SPIE 1989
A. Grill, B.S. Meyerson, et al.
Proceedings of SPIE 1989
Y.Y. Li, K.S. Leung, et al.
J Combin Optim
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004