Conference paper
Characterization of a next generation step-and-scan system
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
This paper considers the number of inner iterations required per outer iteration for the algorithm proposed by Conn et al. [9]. We show that asymptotically, under suitable reasonable assumptions, a single inner iteration suffices.
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
F. Odeh, I. Tadjbakhsh
Archive for Rational Mechanics and Analysis