Conference paperLithographic characteristics of 193-nm resists imaged at 193 and 248 nmJuliann Opitz, Robert D. Allen, et al.Microlithography 1998
PaperBest L1 approximation by weak chebyshev systems and the uniqueness of interpolating perfect splinesCharles A MicchelliJournal of Approximation Theory
Conference paperStrategies for registering range images from unknown camera positionsFausto Bernardini, Holly RushmeierProceedings of SPIE - The International Society for Optical Engineering
PaperThe multiplicative complexity of the Discrete Fourier TransformL Auslander, E Feig, et al.Advances in Applied Mathematics