Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Zelen and Dannemiller [8] proposed a general life distribution function using a weighted sum of Laguerre polynomials (with non-constant weights). Their results are extended here by obtaining the distribution of the ratio of two random variables having this general life distribution. This result is used to examine the robustness of the two-sample exponential likelihood ratio test for comparing means. The test is found to be markedly nonrobust. © 1971, Taylor & Francis Group, LLC.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Peter Wendt
Electronic Imaging: Advanced Devices and Systems 1990
R.B. Morris, Y. Tsuji, et al.
International Journal for Numerical Methods in Engineering
George Markowsky
J. Math. Anal. Appl.