Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We prove the direct sum conjecture for various sets of systems of bilinear forms. Our results depend on a priori knowledge of the complexity of at least one of the direct summands and its underlying algebraic structure. We also briefly survey some previous results concerning the complexity and structure of minimal algorithms for various direct sum systems. © 1984.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Michael E. Henderson
International Journal of Bifurcation and Chaos in Applied Sciences and Engineering
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Shu Tezuka
WSC 1991