Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
PaperExploring context and content links in social media: A latent space methodGuo-Jun Qi, Charu Aggarwal, et al.IEEE TPAMI
PaperBonsai trees, or how to delegate a lattice basisDavid Cash, Dennis Hofheinz, et al.Journal of Cryptology
Conference paperBetter on wafer performance and mask manufacturability of contacts with no or non-traditional serifsDonald Samuels, Ian StobertSPIE Photomask Technology + EUV Lithography 2007
