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Modeling polarization for Hyper-NA lithography tools and masks
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We give a numerical criterion for a badly conditioned zero of a system of analytic equations to be part of a cluster of two zeros.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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Journal of Computer and System Sciences
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Mathematical Biosciences
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Microlithography 1998