Journal of Computer and System Sciences

Paper

01 Jan 1980

On formulating simultaneity for studying parallelism and synchronization

View publication

Abstract

No abstract available.

Conference paper

Integration of polymer self-assembly for lithographic application

Joy Y. Cheng, Daniel P. Sanders, et al.

SPIE Advanced Lithography 2008

Conference paper

IT service management automation - A hybrid methodology to integrate and orchestrate collaborative human centric and automation centric workflows

Naga Ayachitula, Melissa Buco, et al.

SCC 2007

Paper

Gradient Flows and Riemannian Structure in the Gromov-Wasserstein Geometry

Zhengxin Zhang, Ziv Goldfeld, et al.

Foundations of Computational Mathematics

Conference paper

Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm

Juliann Opitz, Robert D. Allen, et al.

Microlithography 1998

View all publications