Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
The problem of factoring positive operators into an "outer" factor and its adjoint has been studied, and its application to the theory of non-stationary random processes is discussed. This problem is an extension of the classical one of factoring positive matrix-valued functions defined on the unit circle of the complex plane into similar factors. © 1971.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
L Auslander, E Feig, et al.
Advances in Applied Mathematics
Yi Zhou, Parikshit Ram, et al.
ICLR 2023
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009