R. Ghez, J.S. Lew
Journal of Crystal Growth
The present capability of obtaining ohmic contacts to GaAs over a range of doping levels is reviewed. Possible models of transport across the metal-semiconductor interface are discussed and contact techniques are described. The widely used AuGe alloyed contact is seen to have a spatially inhomogeneous interface which appears to control its contact resistance. The most satisfactory process at this time is to alloy into a previously fabricated heavily doped layer. © 1983.
R. Ghez, J.S. Lew
Journal of Crystal Growth
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
J. Tersoff
Applied Surface Science
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.