About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Applied Physics Letters
Paper
Novel method of patterning YBaCuO superconducting thin films
Abstract
A unique method of patterning YBaCuO thin films based on the inhibition of superconductivity by Si-YBaCuO intermixing has been developed. In the experiment, a thin Si film was first evaporated on a MgO substrate and subsequently patterned using laser direct-write etching. Multilayered YBaCuO thin films were then deposited by e-beam evaporation and annealed in a rapid thermal annealing system for 30-90 s at 980°C. The YBaCuO film deposited on the silicon regions became insulating. Auger depth profiling measurements indicate that Si-YBaCuO intermixing had occurred in these areas. Between the insulating regions, narrow YBaCuO superconducting lines were formed. For both 10-μm-wide, 1-mm-long and 2.5-μm-wide, 80-μm-long lines, the T c was observed above 76 K. The critical current density of the lines was measured to be 300 A/cm2 at 75 K. This patterning technique may be useful for fabrication of high Tc superconducting interconnects and devices.