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Photomask and Next-Generation Lithography Mask Technology 2004
Stability properties similar to A-stability are established for implicit linear multistep formulas, LMF, when applied to nonlinear stable systems. Sufficient criteria are given which guarantee the fixed-h stability of the global numerical error for various classes of nonlinearities. These criteria relate the behavior of the root-locus curve defined by the LMF to the dissipative properties of the system. A simple criterion for the stability of a composite system is also given. © 1977.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
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SPIE Advances in Semiconductors and Superconductors 1990
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International Journal of Computer Mathematics
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SPIE Optical Engineering + Applications 2007