Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Using the conventional drift-diffusion model, multiple steady state solutions are constructed for a PNPN-junction structure using a combination of numerical and asymptotic techniques. We assume constant mobilities and a piecewise constant doping profile. © 1989.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
W.F. Cody, H.M. Gladney, et al.
SPIE Medical Imaging 1994
Jonathan Ashley, Brian Marcus, et al.
Ergodic Theory and Dynamical Systems
Guo-Jun Qi, Charu Aggarwal, et al.
IEEE TPAMI