Investigations of silicon nano-crystal floating gate memories
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Discontinuous W films have been used as diffusion markers to study interdiffusion during the sequential formation of CuAl2, CuAl and Cu9Al4 intermetallic compounds in bimetallic Al and Cu thin films. Rutherford backscattering spectroscopy has been used to determine marker displacement. For the formation of CuAl2 between Cu and Al, both diffuse. For the formation of CuAl between Cu and CuAl2, Cu is the dominant diffusing species. However, for the formation of Cu9Al4 between Cu and CuAl, again both Cu and Al diffuse. © 1983.
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Mitsuru Ueda, Hideharu Mori, et al.
Journal of Polymer Science Part A: Polymer Chemistry
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
Julien Autebert, Aditya Kashyap, et al.
Langmuir