PaperSecondary patterning of UV imprint features by photolithographyMartha F. Montague, Craig J. HawkerChemistry of Materials
PaperPatterned nanoporous poly(methylsilsesquioxane) thin films: A potential high density substrateZach L. Hogan, Cortney R. Kreller, et al.Materials Science and Engineering C
PaperNanoscopic templates from oriented block copolymer filmsThomas Thurn-Albrecht, Rachel Steiner, et al.Advanced Materials
PaperA Tandem Approach to Graft and Dendritic Graft Copolymers Based on "Living" Free Radical PolymerizationsRobert B. Grubbs, Craig J. Hawker, et al.Angewandte Chemie (International Edition in English)