Grégory Abadias, Eric Chason, et al.
JVSTA
Novel techniques have been applied to model realistic alpha particle source distributions in complex back-end-of-the-line geometries. Rigorous Monte Carlo simulations with high resolution have been performed to analyze the charge collection in 45 nm SOI test devices. These studies reveal soft fail sensitivity to the topologies of the alpha particle source and the BEOL structure. © 2009 IEEE.
Grégory Abadias, Eric Chason, et al.
JVSTA
Conal E. Murray
SEM Annual Conference on Experimental and Applied Mechanics 2011
Praneet Adusumilli, Conal E. Murray, et al.
ECS Meeting 2009
Martin M. Frank, Cyril Cabral, et al.
IEEE Electron Device Letters