Metal-containing release layers for use with UV-cure nanoimprint lithographic template materials

Ultrathin films of amorphous metal oxides and nitrides are evaluated as potential release coatings for UV-cure nanoimprint templates in combination with diverse resist chemistries. Although adhesive behaviors cover a broad range, when paired with a compatible resist use of a metal containing release layer allows adhesion energies approaching the van der Waals limit, with clean fracture at the resist release layer interface, to be obtained. These films provide an alternative to the more commonly used fluoroalkyl silanes and other release treatments. © 2008 American Vacuum Society.