American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Paper

01 Apr 1997

Mechanistic studies of chemically amplified photoresists

Paper

Nonadiabaticity in ion-molecule reactions: Coupling of proton and charge transfer in the H₂⁺ and D₂⁺ Ar system

F.A. Houle, S.L. Anderson, et al.

The Journal of Chemical Physics

Paper

Novel fluoropolymers for use in 157 nm lithography

Hiroshi Ito, G.M. Wallraff, et al.

J. Photopolym. Sci. Tech.

Paper

Studies of Chain Conformational Kinetics in Poly(di-n-alkylsilanes). 5. The Effect of Side-Chain Structure on Piezochromism

K. Song, R.D. Miller, et al.

Macromolecules

Conference paper

Chemistry controlling nanoscale pattern formation by deep UV photolithography

F.A. Houle, W.D. Hinsberg, et al.

ACS Spring 1999

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